Pentax 2011 Annual Report Download - page 11

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The future for EUV and Hoya’s goals
The most advanced semiconductors that are made
today require a design rule of 40nm to 30nm. But the
industry is now on the verge of the 20nm (generally
referred to as 2Xnm) era. That means EUV lithography
will probably move from research facilities to
production facilities at last.
s the world’s largest supplier of mask blanks, Hoya
long ago began EUV research activities. Over the
years, Hoya steadily moved closer to commercializing
this technology by surmounting one hurdle after
another. Mass-production EUV equipment will probably
appear after a few more years. Hoya is determined to
retain its position as the leading mask blank
manufacturer as the semiconductor industry makes the
transition to EUV lithography.
This commitment reflects HOYA’s mission of
contributing to the semiconductor industry in a
supporting role by keeping pace with progress with design rules, no matter how fine circuit
patterns become.
Semiconductor devices are a vital part of many products, and mask blanks in turn are an
essential part of the production of these devices. Recognizing the importance of these blanks,
Hoya is firmly dedicated to fulfilling its mission of supplying blanks regardless of the associated
risks.
Our mission as the leading manufacturer of mask blanks
IBD System