AMD 2003 Annual Report Download - page 196

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E51100008 Sputtering system ENDURA-5500-HP Applied Materials 199604
E51100009 Sputtering system ENDURA 5500 HP Applied Materials 199605
E51100010 Sputtering system ENDURA 5500 HP Applied Materials 199605
E51100012 Back-grinder DFG-840 Disco 199801
E52100001 SOG system CLEANTRACK-MK8 Tokyo Electron 199408
E52100002 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199408
E52100003 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199408
E52100004 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199408
E52100005 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199408
E52100006 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199408
E52100007 Quick rework CLEANTRACK-MK7 Tokyo Electron 199408
E52100009 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199504
E52100012 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199507
E52100013 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199508
E52100016 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199508
E52100017 SOG system CLEANTRACK-MK8 Tokyo Electron 199509
E52100018 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199509
E52100019 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199510
E52100020 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199511
E52100021 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199511
E52100022 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199512
E52100023 Coater / developer CLEANTRACK-MK8 AO Tokyo Electron 199602
E52100024 SOG system CLEANTRACK-MK8 Tokyo Electron 199603
E52100025 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199603
E52100026 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199604
E52100027 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199604
E52100028 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199604
E52100029 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199604
E52100030 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199604
E52100031 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199604
E52100032 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199604
E52100033 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199604
E52100034 Coater / developer CLEANTRACKMARK-8 Tokyo Electron 199605
E52100035 Coater / developer CLEANTRACKMARK-8 Tokyo Electron 199605
E52100036 Coater / developer CLEANTRACKMARK-8 Tokyo Electron 199605
E52100037 Coater / developer CLEANTRACKMARK-8 Tokyo Electron 199605
E52100038 Coater / developer CLEANTRACKMARK-8 Tokyo Electron 199605
E52100039 Coater / developer CLEANTRACKMARK-8 Tokyo Electron 199605
E52100040 SOG system CLEANTRACK-MK8 Beta Tokyo Electron 199607
E52100041 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199607
E52100042 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199705
E52100048 Coater / developer CLEANTRACK-MK8 (TARC) Tokyo Electron 199806
E52100049 Coater / developer CLEANTRACK-MK8 (TARC) Tokyo Electron 199806
E60100011 Process gas monitor RGA Innotech 199508
E60100016 Process gas monitor RGA Innotech 199605
E60100017 Process gas monitor RGA Innotech 199605
E60100018 Process gas monitor RGA Innotech 199605
E60100019 Process gas monitor RGA Innotech 199605
E60100020 Process gas monitor RGA Innotech 199610
E62100001 Vertical diffusion Alpha-808SD Tokyo Electron 199408
E62100002 Vertical diffusion Alpha-808SD Tokyo Electron 199408
E62100003 Vertical diffusion Alpha-808SD Tokyo Electron 199408
E62100004 Vertical diffusion Alpha-808SD Tokyo Electron 199408
E62100005 Vertical diffusion Alpha-808SD Tokyo Electron 199408
Source: ADVANCED MICRO DEVIC, 10-K, March 09, 2004