Canon 2005 Annual Report Download - page 35

Download and view the complete annual report

Please find page 35 of the 2005 Canon annual report below. You can navigate through the pages in the report by either clicking on the pages listed below, or by using the keyword search tool below to find specific information within the annual report.

Page out of 90

  • 1
  • 2
  • 3
  • 4
  • 5
  • 6
  • 7
  • 8
  • 9
  • 10
  • 11
  • 12
  • 13
  • 14
  • 15
  • 16
  • 17
  • 18
  • 19
  • 20
  • 21
  • 22
  • 23
  • 24
  • 25
  • 26
  • 27
  • 28
  • 29
  • 30
  • 31
  • 32
  • 33
  • 34
  • 35
  • 36
  • 37
  • 38
  • 39
  • 40
  • 41
  • 42
  • 43
  • 44
  • 45
  • 46
  • 47
  • 48
  • 49
  • 50
  • 51
  • 52
  • 53
  • 54
  • 55
  • 56
  • 57
  • 58
  • 59
  • 60
  • 61
  • 62
  • 63
  • 64
  • 65
  • 66
  • 67
  • 68
  • 69
  • 70
  • 71
  • 72
  • 73
  • 74
  • 75
  • 76
  • 77
  • 78
  • 79
  • 80
  • 81
  • 82
  • 83
  • 84
  • 85
  • 86
  • 87
  • 88
  • 89
  • 90

Fiscal 2005 Review
Sales in the Optical and Other Products
segment in 2005 surged 17.6%
compared with 2004, totaling
¥373 billion.
The LCD panel market was robust
in 2005, seeing significant increases
over the previous year in unit sales for
notebook and desktop PCs, as well as
for LCD televisions, which dropped
sharply in price, creating stronger
demand and more than doubling unit
sales. Coupled with the introduction of
new products, this overall market strength supported notable sales
growth of Canon’s mask aligners for LCD panels in terms of both
volume and value. Additionally, the vacuum thin-film deposition
and processing equipment produced by Canon ANELVA con-
tributed to expanded sales.
Though relatively weak investment by semiconductor manu-
facturers in 2005 slowed sales of Canon’s steppers, unit base
market share increased slightly compared with the previous year.
As one of its latest 300mm-compatible lithography tools, Canon
introduced the FPA-6000ES6a, a krypton fluoride scanning stepper
enabling volume production at the 90nm process node.
In the medical equipment business, market demand for digital
retinal cameras increased, and Canon achieved record units sales
for its non-mydriatic retinal cameras in 2005, maintaining top
market share. Canon also introduced the CF-60Dsi digital mydriatic
retinal camera, and boosted share in all markets for retinal cameras.
Major products in Canon’s digital radiography device lineup,
including the CXDI-50G, saw increased sales in regions outside
Japan during 2005, helping Canon to maintain top share in the
worldwide market. We are working to expand the domain of
X-ray digital cameras, and expect
sound sales growth in the digital
radiography devices market.
Canon maintained its leading
position in the market for broadcast
television lenses, supported by strong
demand in Europe due to the acceler-
ation of the shift to high-definition
television (HDTV). The HJ22ex7.6B
portable lens for HDTV broadcasting
contributed to increased sales.
33
CXDI-50G
400‚000
01 02 03 04 05
302,717
228,155
249,732
316,821
372,604
Sales Results:
Optical and Other Products
(Millions of yen)
0
Immersion Lithography Technology
Immersion lithography technology that employs ArF
excimer lasers enables more precise circuit patterns,
while significantly reducing investment costs. The
technology involves filling the space between a projec-
tion lens and the wafer with ultrapure water, which
increases the refractive index so that the lens numerical
aperture increases at the same angle even for light.
The method holds the potential to reduce circuit
linewidth down to 45nm for extremely fine exposure.
The limit for ArF excimer laser light sources of 193nm
wavelengths was previously thought to be circuit
linewidth of 65nm.
Canon is focusing on practical applications of the
localized immersion method, “Liquid Film Flow”
method, and the ultra-high NA catadioptric lens.
Finding a liquid with a high refractive index and further
developing projection lenses open the possibility of
approaching a circuit width of 32nm using 193nm
lasers, the same region as EUV light sources.
Localized immersion method
Immersion technology creates
possibilities for more precise circuit
patterns, enabling extremely fine
exposure. By filling the space between
the projection lens and the wafer with
ultrapure water, the lens numerical
aperture is significantly increased.
Ultrapure
water
recovery Projection lens Ultrapure
water
Semiconductor
wafer
Wafer stage
Canon Future Technology
HJ22ex7.6B