Nikon 2007 Annual Report Download - page 11

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KAZUO USHIDA
DIRECTOR, MEMBER OF THE BOARD
& SENIOR EXECUTIVE OFFICER
PRESIDENT OF PRECISION EQUIPMENT COMPANY
OPERATING INCOME MILLIONS OF YEN
NET SALES* MILLIONS OF YEN
advanced IC scanner models. Promoting
module standardization and the use of
simplified designs not only limits the
development risk and required investment
levels, but also helps to reduce costs. Another
benefit is shorter development lead-times,
which means that Nikon can bring new models
to market in a timely manner.
Active development of next-generation
exposure technologies
Anticipating further device shrinkage, Nikon is
working on development of the next
generation of lithography from a number of
angles. One of these approaches to scanner
development is called double patterning. This
overcomes the limitations on resolution
encountered with standard techniques by
dividing pattern transfer into a two-step
process. Achieving this requires a significant
improvement in alignment accuracy. Double
patterning is expected to extend the life of ArF
immersion scanning technology.
Nikon is also focusing on a different and novel
technological approach called EUVL (extreme
ultraviolet lithography). EUVL uses light with a
wavelength 14 times shorter than the 193 nm
for the excimer lasers used in ArF immersion
lithography. EUVL does not use a conventional
lens, instead employing an optics system made
up of mirrors contained in a vacuum.
Device shrinkage is expected to continue in the
future. By developing these technologies,
Nikon aims to build a business with substantial
growth potential and a highly profitable
earnings structure.
07
06
05
292,562
243,207
214,326
07
06
05
49,321
26,375
11,387
Years ended March 31 Years ended March 31
*The above figures include intersegment sales.
NIKON ANNUAL REPORT 2007 09