AMD 2004 Annual Report Download - page 169

Section 1.704-1(b)(2)(iv)(m); provided, however, that Gross Asset Values shall not be adjusted pursuant to this subsection (4) of this definition to the extent that
the Board of Managers reasonably determines that an adjustment pursuant to subsection (2) of this definition above is necessary or appropriate in connection with
a transaction that would otherwise result in an adjustment pursuant to this subsection (4) of this definition.
(5) If the Gross Asset Value of a Company Asset has been determined or adjusted pursuant to subsections (1), (2) or (4) of this definition, such
Gross Asset Value shall thereafter be adjusted by the Depreciation taken into account with respect to such Company Asset for purposes of computing Net Profits
and Net Losses.
“Guaranteed Percentage” is defined in Section 4.1.2(a).
“HR Council” is defined in Section 7.15.
“Indemnified Loss” is defined in Section 7.11.1.
“Indemnitee” is defined in Section 7.11.1.
“Initial Bid End-Date” is defined in Section 9.3.9(c).
“Initial Public Offering” means a bona fide underwritten initial sale of common stock (or other securities) of a Person pursuant to a registration
statement that is declared effective by the SEC.
“Investment Advisers Act” means the Investment Advisers Act of 1940, as amended.
“Investment Company Act” means the Investment Company Act of 1940, as amended.
“IP Contribution Agreement” means the Intellectual Property Contribution and Ancillary Matters Agreement dated as of June 30, 2003 among
Fujitsu, AMD and the Company.
“IPO Valuation” means the Valuation described in Section 9.3.1.
“IT” is defined in Section 7.13.
“IT Steering Committee” is defined in Section 7.13.
“Joint Territory” has the meaning set forth in the AMD Distribution Agreement and in the Fujitsu Distribution Agreement.
“JV1” means the wafer fabrication facility currently for 0.35 micron products located at Industrial Site 6, Monden-machi, Aizuwakamatsu-shi,
Fukushima, Japan.
“JV2” means the wafer fabrication facility currently for 0.23 micron products located at Industrial Site 6, Monden-machi, Aizuwakamatsu-shi,
Fukushima, Japan.
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Confidential treatment has been requested for portions of this exhibit. The copy filed herewith omits the information subject to the confidentiality request.
Omissions are designated as ****. A complete version of the exhibit has been filed separately with the Securities and Exchange Commission.
Source: ADVANCED MICRO DEVIC, 10-K, March 01, 2005