AMD 2003 Annual Report Download - page 195

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E48200021 Wet station WS-852 Dainippon Screen 199604
E48200022 Wet etch system FWET Dainippon Screen 199605
E48200023 Wet station WS-840 Dainippon Screen 199704
E48200040 Mercury for CM MERCURY M-FSI 199806
E48200041 Mercury for II MERCURY WITH ROBOT M-FSI 199806
E48300003 Plasma CVD system P-5000 (3CHB) Applied Materials 199408
E48300004 Plasma CVD system CONCEPTONE-W Seki Technotron 199408
E48300005 Plasma CVD system P-5000 (2CHB) Applied Materials 199408
E48300008 Plasma CVD system P-5000 (3CHB) Applied Materials 199505
E48300009 Vertical CVD furnace Alpha-808SC Tokyo Electron 199505
E48300011 Plasma CVD system P-5000 (2CHB) Applied Materials 199510
E48300012 Plasma CVD system P-5000 (3CHB) Applied Materials 199510
E48300013 BPSG deposition system APT-5800 CANON 199602
E48300014 Plasma CVD system P-5000 (3CHB) Applied Materials 199603
E48300015 Plasma CVD system P-5000 (3CHB) Applied Materials 199603
E48300016 WSi deposition system MB2-730 Tokyo Electron 199603
E48300017 Plasma CVD system P-5000 (3CHB) Applied Materials 199603
E48300018 BPSG deposition system APT-5800 CANON 199603
E48300019 Plasma CVD system CONCEPT ONE Seki Technotron 199603
E48300020 BPSG deposition system APT-5800 CANON 199604
E48300021 Plasma CVD system P-5000 (3CHB) Applied Materials 199605
E48300022 Plasma CVD system P-5000 (3CHB) Applied Materials 199605
E48300023 Plasma CVD system CONCEPT ONE-W Seki Technotron 199607
E48300024 BPSG deposition system APT-5800 BPSG CANON 199610
E48300025 Plasma CVD system P-5000 (3CHB) Applied Materials 199703
E49100001 Wet strip WSST Tokyo Electron 199408
E49100004 Wet strip WSST Tokyo Electron 199505
E49100006 Wet strip WSST (2CHB) Tokyo Electron 199511
E49100007 Spray solvent tool DUAL CHAMBER Tokyo Electron 199603
E49100008 Spray solvent tool DUAL CHAMBER Tokyo Electron 199603
E49200001 Spin scrubber SSW-80A-AR (2 lanes) Dainippon Screen 199408
E49200002 Spin scrubber SSW 80A AVR (2 lanes) Dainippon Screen 199408
E49200003 Spin scrubber SSW-80A-AR (2 lanes) Dainippon Screen 199504
E49200004 SOS coater SC-W80A-AVG (BLQ) Dainippon Screen 199511
E49200005 Spin scrubber SSW-80A-AVR Dainippon Screen 199603
E49200006 Spin scrubber SSW-80A-AVR Dainippon Screen 199603
E49200007 Spin scrubber SSW-80A-AVR Dainippon Screen 199603
E49200008 Spin scrubber SSW-80A-AVR Dainippon Screen 199603
E49200009 Spin scrubber SSW-80A-AVR Dainippon Screen 199603
E49200011 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199703
E49200012 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199703
E49200013 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199706
E49200014 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199706
E49200015 Coater / developer CLEANTRACK-MK8 Tokyo Electron 199706
E50100002 Polisher AVANTI472 Tokyo Electron 199512
E50100003 Cleaner MERCURY MP M-FSI 199512
E50100008 Polisher AVANTI 472 Tokyo Electron 199603
E50100009 Polisher AVANTI472 Tokyo Electron 199708
E50100013 CMP STRB-6DS SC Semicon Technology 199806
E51100002 Sputtering system ENDURA HP Applied Materials 199408
E51100003 Sputtering system ENDURA HP Applied Materials 199408
E51100005 Sputtering system ENDURA5500 HP Applied Materials 199507
E51100006 Back-grinder DFG-840 Disco 199603
E51100007 Sputtering system ENDURA-5500-HP Applied Materials 199604
Source: ADVANCED MICRO DEVIC, 10-K, March 09, 2004